International Research Center "Piezo- and Magnetoelectric Materials"
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Research Center "Physical Materials Science and Composite Materials"
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Research Center "Physical Materials Science and Composite Materials"
We create materials for the future
What are we doing
The scientific work of the international research center is aimed at developing new smart materials for various industries, primarily for biomedical purposes, renewable energy and new generation flexible electronics. The developments of the Biomedical Center ensure the transfer of technologies, which, in particular, contribute to the transition to personalized medicine, high-tech healthcare and health-saving technologies
News
Our Channel
Study of new principles of construction (design) of materials with predetermined properties (for example, the flexoelectric effect; the effect of structural defects on the electromechanical and electrophysical characteristics of piezomaterials, etc.)
(Lecture by the director of center - Roman Anatolyevich Surmenev)
We are in the media
Development and research of new types of biocompatible materials and coatings to replace or restore damaged tissues
(Lecture by the curator - Maria Kozadayeva)
Smart Composite Materials for Nervous Tissue Regeneration
(Lecture by the curator - Shlapakova L.E.)
Research interests
Head of direction - Chernozem Roman Viktorovich
Head of direction - Maria Kozadayeva
Head of direction - Shlapakova Lada Evgenievna
Head of direction - Grubova Irina Yurievna
Team(Researchers)
- Surmenev Roman AnatolievichDoctor of Technical Sciences, Professor, Director
rsurmenev@mail.ru - Surmeneva Maria AlexandrovnaCandidate of Physical and Mathematical Sciences, Senior Research Scientist
surmenevamaria@mail.ru - Chernozem Roman ViktorovichPhD, Associate Professor, Senior Research Scientist
romanchernozem@gmail.com - Grubova Irina YurievnaPhD, Senior Research Scientist
rodeo_88@mail.ru - Mukhortova Yulia RuslanovnaEngineer
phenics100@gmail.com - Chernozem Polina ViktorovnaResearch engineer
polinachernozem@gmail.com - Kozadayeva MariaEngineer
mariakoz71@gmail.com - Khrapov DmitriyResearch engineer
cheshirskyvolk@mail.ru - Shlapakova Lada EvgenievnaResearch engineer
les2@tpu.ru - Abdullah Bin FirozResearch engineer
er.abdullahbinfiroz@gmail.com - Sharonova Anna AlexandrovnaCandidate of Physical and Mathematical Sciences, Engineer
anek764@yandex.ru - Zhuravlev Oleg BorisovichEngineer
obzhuravlev@tpu.ru - Rybakov Vladimir AndreevichEngineer
8426852@mail.ru
Team(Students)
- Urakova Alina OlegovnaPhD student, Engineer
urakowa.alina@yandex.ru - Fetisova Anastasia AlekseevnaPhD student, Research engineer
zerospace25@gmail.com - Koptsev Danila AndreevichMaster, laboratory Assistant
danilakoptcev@yandex.ru - Baksheev Artyom IgorevichMaster, laboratory Assistant
artem27cc@gmail.com - Anorin Vitaliy EvgenievichMaster, laboratory Assistant
vea7@tpu.ru - Mamatova Alina ManasovnaPhD student, laboratory Assistant
amm25@tpu.ru
Small
Ceramics International
Materials Today
Advanced Materials
Nano Today
ACS
Recent publications
We work hard every day to make people's lives even better
Partners
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National Research "Tomsk Polytechnic University"
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Skolkovo Institute of Science and Technology
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Sichuan University (SCU)
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Institute of Cytology and Genetics, Siberian Branch of the Russian Academy of Sciences
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Federal Research Center "Institute of Catalysis SB RAS"
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Lomonosov Moscow State University
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Siberian State Medical University
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University of Aveiro, Portugal
Equipment
AixACCT TF Analyser 2000
The device allows you to measure dynamic and static hysteresis loops of polarization, deformation, permittivity and piezoelectric coefficient, leakage currents, polarization switching current, to investigate the effects of fatigue and aging
Research methods:
Main characteristics:
Research methods:
- Dynamic and static hysteresis loops of polarization, strain, permittivity and piezoelectric coefficient
- Pyroelectric measurements
- Measurement of leakage currents
- Polarization switching current measurement
- Research on the effects of fatigue and aging
Main characteristics:
- Precision current-to-voltage converter
- Cells for measurement of bulk materials and thin films with temperature control
- Internal and external amplifiers with maximum voltage up to 10 kV
- Laser interferometric displacement sensor with 0.3 nm resolution
- Hysteresis loop measurement frequency from 1 MHz to 1 MHz
Microwave Autoclave System (Ethos up, Milestone)
Microwave acid digestion (mineralization) is today the accepted standard for sample preparation for spectral analysis methods such as atomic absorption, ICP-OES, MP-AES and ICP-MS. environmental laboratories, biological crystals in biological research, geology and metallurgy, pharmaceuticals, petrochemistry and energy, production of polymers, ceramics, nanochemistry, refractories, etc. The undisputed leader in the development and production of microwave sample preparation systems is Milestone (Italy), which founded almost all technologies and constructive solutions in this area.
The new Ethos UP and ETHOS EASY models bring a new level of convenience and productivity to sample preparation.
The new Ethos UP and ETHOS EASY models bring a new level of convenience and productivity to sample preparation.
Spin Coating System
Large substrates are no longer a problem for centrifugation. Apex brings you the SpinNXG-P2 printer, which makes it easy to process larger media even at high speeds up to 10,000 rpm. Safety is a major concern with high angular momentum, which is why the SpinNXG-P2 comes pre-installed with a built-in lid lock to ensure safety during the plating process. It also has a field dispensing port over a photoresist cover and a large graphical LCD console for displaying a real-time rotation per minute (V/s) graph over time.
Vacuum tube furnace
BR-12NT,BR-14ST,BR-16MT series thermal vacuum tube furnace uses high-purity quartz tube or high-purity alumina tube as the furnace tube, and the operating temperature range is from 300℃ to 1600℃. Customers can choose according to actual needs. The control system of this series of equipment is world leading, with the characteristics of safety and reliability, simple operation, high temperature control precision, good heat preservation effect, high furnace temperature uniformity and atmosphere vacuuming. It is widely used for high temperature sintering processing experiments of metal materials. ,quality testing and small-scale production in colleges and VZUAH, research institutes, industrial and mining enterprises.
Tube furnaces of the BR-12NT, BR-14ST, BR-16MT series are horizontal, the heating elements are located directly on the working pipe. Operating temperature – 1200°，1400° and 1600°C.
Tube furnaces of the BR-12NT, BR-14ST, BR-16MT series are horizontal, the heating elements are located directly on the working pipe. Operating temperature – 1200°，1400° and 1600°C.
Planetary Ball mill
Planetary ball mills find wide applications in various fields due to their ability to finely grind or mix materials to extremely small particle sizes. Here are some common applications of planetary ball mills:
- Material Research and Nanotechnology: Planetary ball mills are extensively used in material research and nanotechnology for synthesizing and processing advanced materials. They are employed in the production of nanoparticles, nanocomposites, and nanocrystalline materials with precise control over particle size and distribution.
- Ceramics and Glassware: Planetary ball mills are utilized in the preparation of ceramic powders and glassware. They can finely grind raw materials, such as oxides, carbonates, and silicates, to produce homogeneous ceramic powders or glass frits used in the fabrication of ceramics, glass, and glazes.
- Chemical Industry: In the chemical industry, planetary ball mills are employed for various processes, including chemical synthesis, mixing, and grinding of chemicals. They are used in the production of catalysts, pharmaceuticals, pigments, and dyes, where precise control over particle size and distribution is crucial.
- Pharmaceuticals: Planetary ball mills are used in pharmaceutical research and development for grinding, mixing, and homogenizing pharmaceutical compounds and excipients. They are instrumental in the preparation of drug formulations, nanomedicines, and controlled-release drug delivery systems.
- Metallurgy and Alloying: Planetary ball mills are employed in metallurgical research and alloying processes for synthesizing metal alloys and composites. They can finely grind metallic powders and mix them with alloying elements to produce advanced metal alloys with desired properties, such as improved strength, hardness, and corrosion resistance.
- Battery Materials: In the field of energy storage, planetary ball mills are used for preparing electrode materials for lithium-ion batteries and other energy storage devices. They can finely grind electrode materials, such as graphite, lithium cobalt oxide, and metal oxides, to enhance their electrochemical performance and energy storage capacity.
Preparation of polymer nanofibers by electrospinning (electrospinning)
Applications of Electrospun Nanofibers:
- Tissue Engineering and Regenerative Medicine: Electrospun nanofibers are used as scaffolds for tissue engineering applications due to their high surface area, porosity, and similarity to the extracellular matrix. They promote cell adhesion, proliferation, and differentiation.
- Drug Delivery Systems: Electrospun nanofibers are utilized for the controlled release of drugs and therapeutic agents. Nanofibrous drug delivery systems offer tunable drug release kinetics, enhanced bioavailability, and targeted delivery to specific sites.
- Filtration and Separation: Electrospun nanofiber membranes are employed in filtration and separation processes for air filtration, water treatment, and biomedical filtration applications. They exhibit high efficiency, mechanical strength, and uniform pore size distribution.
- Sensors and Biosensors: Electrospun nanofibers are used in the fabrication of sensors and biosensors for detecting various analytes, including gases, chemicals, and biomolecules. Functionalization of nanofibers enhances their sensitivity and selectivity for specific applications.
- Energy Storage and Conversion: Electrospun nanofibers are investigated for energy storage and conversion applications, such as lithium-ion batteries, supercapacitors, fuel cells, and solar cells. They serve as electrodes, separators, and electrolytes in these devices.
- Textiles and Apparel: Electrospun nanofibers are integrated into textiles and apparel for enhancing properties such as breathability, moisture management, antimicrobial activity, and UV protection.
Magnetron installation for sputtering electrodes
A magnetron sputtering system is a type of physical vapor deposition (PVD) system used for depositing thin films of various materials onto substrates. Here's how a magnetron sputtering installation typically works for sputtering electrodes:
- Vacuum Chamber: The system consists of a vacuum chamber where the sputtering process takes place. The chamber is evacuated to create a low-pressure environment, typically below 10^-3 Torr, to prevent contamination and promote uniform film deposition.
- Target Material: The material to be sputtered, known as the target or electrode, is mounted inside the vacuum chamber. The target material can be a metal, alloy, ceramic, or semiconductor, depending on the desired film composition and properties.
- Substrate Holder: Substrates, such as silicon wafers, glass slides, or metal plates, are mounted on a substrate holder positioned opposite the target material. The substrates will receive the sputtered material and form the thin film.
- Magnetron Source: A magnetron source is used to generate a magnetic field around the target material. The magnetic field enhances the sputtering process by confining the plasma near the target surface, increasing the sputtering efficiency and improving film quality.
- Sputtering Gas: A sputtering gas, such as argon (Ar), is introduced into the vacuum chamber at a controlled flow rate. The sputtering gas fills the chamber and ionizes when subjected to an electric field, forming a plasma.
- DC or RF Power Supply: A DC or radio frequency (RF) power supply is connected to the target material to apply a negative voltage. This voltage accelerates the positively charged ions in the plasma towards the target surface, causing them to collide with the target atoms and dislodging them through a process called sputtering.
- Sputtered Material Deposition: The sputtered target material atoms are ejected from the target surface and travel in straight lines, depositing onto the substrates positioned opposite the target. The substrate holder can be rotated or tilted to ensure uniform film deposition across the substrate surface.
- Film Thickness Control: The thickness of the deposited thin film can be controlled by adjusting parameters such as sputtering time, sputtering power, target-to-substrate distance, and sputtering gas pressure.
- Film Characterization: After deposition, the thin film's properties, such as thickness, composition, morphology, and optical or electrical properties, can be characterized using techniques such as scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray diffraction (XRD), and spectroscopic ellipsometry.
RF Magnetron Sputtering Installation
An RF (Radio Frequency) magnetron sputtering installation is a type of physical vapor deposition (PVD) system used for depositing thin films of various materials onto substrates. Here's an overview of how an RF magnetron sputtering installation typically works:
- Vacuum Chamber: The system consists of a vacuum chamber where the sputtering process takes place. The chamber is evacuated to create a low-pressure environment, typically below 10^-3 Torr, to prevent contamination and promote uniform film deposition.
- Target Material: The material to be sputtered, known as the target, is mounted inside the vacuum chamber. The target material can be a metal, alloy, ceramic, or semiconductor, depending on the desired film composition and properties.
- Substrate Holder: Substrates, such as silicon wafers, glass slides, or metal plates, are mounted on a substrate holder positioned opposite the target material. The substrates will receive the sputtered material and form the thin film.
- RF Power Supply: An RF power supply is used to generate an oscillating electric field between the target and the substrate. The RF power supply applies a high-frequency alternating voltage (typically in the MHz range) to the target material, creating a plasma discharge.
- Sputtering Gas: A sputtering gas, such as argon (Ar), is introduced into the vacuum chamber at a controlled flow rate. The sputtering gas fills the chamber and ionizes when subjected to the RF electric field, forming a plasma.
- Magnetron Source: A magnetron source is used to generate a magnetic field around the target material. The magnetic field enhances the sputtering process by confining the plasma near the target surface, increasing the sputtering efficiency and improving film quality.
- Sputtering Process: The RF power supply creates an oscillating electric field that accelerates the positively charged ions in the plasma towards the target surface. These ions collide with the target atoms, dislodging them from the target surface through a process called sputtering.
- Deposition onto Substrates: The sputtered target material atoms are ejected from the target surface and travel in straight lines, depositing onto the substrates positioned opposite the target. The substrate holder can be rotated or tilted to ensure uniform film deposition across the substrate surface.
- Film Thickness Control: The thickness of the deposited thin film can be controlled by adjusting parameters such as sputtering time, RF power, target-to-substrate distance, and sputtering gas pressure.
- Film Characterization: After deposition, the thin film's properties, such as thickness, composition, morphology, and optical or electrical properties, can be characterized using techniques such as scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray diffraction (XRD), and spectroscopic ellipsometry.
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Contact us
+7 (903) 953 09 69
rsurmenev@mail.ru
Lenin Ave., 43, Tomsk, Tomsk region, 634034
Our main office is located in room 118 of building 3 of Tomsk Polytechnic University
rsurmenev@mail.ru
Lenin Ave., 43, Tomsk, Tomsk region, 634034
Our main office is located in room 118 of building 3 of Tomsk Polytechnic University
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